CMOS image sensors and methods for fabricating the same

ABSTRACT

CMOS image sensors and methods for fabricating the same are disclosed. A disclosed CMOS image sensor comprises: a semiconductor substrate; a photo diode; a microlens located over the photo diode; and a color filter layer located over the microlens.

FIELD OF THE DISCLOSURE

The present disclosure relates generally to image sensors and, moreparticularly, to CMOS image sensors and methods for fabricating thesame.

BACKGROUND

Image sensors are semiconductor devices for converting an optical imageinto an electric signal. In general, an image sensors is either a chargecoupled devices (CCD) or a CMOS (Complementary Metal Oxide Silicon)image sensor.

The charge coupled device (CCD) is provided with a matrix of photodiodes (PD). Each photo diode converts an optical signal into anelectric signal. The CCD also includes a plurality of vertical chargecoupled devices (VCCD). Each of the VCCDs is formed between verticallines of the photo diodes in the matrix for transmission of chargesgenerated at the photo diodes in a vertical direction. The CCD alsoincludes a horizontal charge coupled device (HCCD) for transmission ofthe charges transmitted through the VCCDs in a horizontal direction. Inaddition, the CCD includes a sense amplifier for sensing the chargestransmitted in the horizontal direction and outputting an electricsignal.

However, the CCD is disadvantageous in that it has a complicated drivingmethod, exhibits high power consumption, and is produced via acomplicate fabrication process involving multiple photo process stages.Moreover, CCDs have another disadvantage in that it is difficult toinclude a CCD in a small product due to the difficulty in integrating acontrol circuit, a signal processing circuit, an A/D converter, and thelike on a CCD chip.

Recently, the CMOS sensor has been heralded as the next generation imagesensor that can overcome the disadvantages of CCDs. The CMOS imagesensor is a device that employs CMOS technology to capture an image.Specifically, a control circuit, a signal processing circuit, and thelike are used as peripheral circuits for successively detecting outputsfrom pixels using MOS transistors. A MOS transistor is formed on thesemiconductor substrate for each pixel. That is, the CMOS image sensorhas a photo diode and a MOS transistor formed within each unit pixel. Bymonitoring the switching of the MOS transistors, the CMOS image sensorsuccessively detects electric signals from the photo diodes of the unitpixels to reproduce an image.

The CMOS image sensor exhibits low power consumption and enjoys a simplefabrication process as a result of fewer photo process stages. Moreover,the CMOS image sensor is advantageous in that products incorporating theCMOS image sensor can easily be made smaller because a control circuit,a signal processing circuit, an A/D converter, and the like can beintegrated on a CMOS image sensor chip. Accordingly, the CMOS imagesensor has a wide range of applications, such as in a digital stillcamera, in digital video cameras, and the like.

A prior art CMOS image sensor will now be described with reference tothe attached drawings. FIG. 1 illustrates a circuit equivalent to onepixel of a prior art CMOS image sensor. FIG. 2 is a cross-sectional viewof the prior art CMOS image sensor.

Referring to FIG. 1, the pixel unit of the prior art CMOS image sensoris provided with one photo diode (PD), and three NMOS transistors T1,T2, and T3. The photo diode PD has a cathode connected to both a drainof the first NMOS transistor T1 and a gate of the second NMOS transistorT2. Both the first and the second NMOS transistors T1, T2 have sourcesconnected to a power source providing a reference voltage VR. The firstNMOS transistor T1 has a gate connected to a reset line providing areset signal RST. The third NMOS transistor T3 has a source connected tothe drain of the second NMOS transistor. It also has a drain connectedto a reading circuit (not shown) via a signal line, and a gate connectedto a row selection line providing a selection signal SLCT. The firstNMOS transistor T1 is called a reset transistor, the second NMOStransistor T2 is called a drive transistor, and the third NMOStransistor T3 is called a selection transistor.

The greater the light reception of the photo diode PD, the better thephotosensitivity of the image sensor. Consequently, there have beenefforts to increase the ratio of an area of the photo diode to theentire area of the image sensor, (i.e., to increase a fill factor), tothereby enhance the photosensitivity of the image sensor. However, sinceelimination of a logic circuit having transistors and the like from theCMOS image sensor is basically impossible, efforts to increase the fillfactor have been inherently limited, because the fill factor may only beincreased within a limited area.

Faced with such a problem, focusing technology has been suggested forenhancing the photosensitivity of the photo diode. In such approaches,the paths of light rays incident on regions other than the photo diodePD are changed, so that the light rays are focused onto the photo diodePD. A common approach to re-focusing light rays in this manner ismicrolens forming technology.

Referring to FIG. 2, a prior art CMOS image sensor having a microlens isshown. The image sensor of FIG. 2 is provided with a semiconductorsubstrate 101 having one or more active region(s) defined by one or moredevice isolating film(s) 102, one or more photo diode(s) 103 formed onpredetermined portion(s) of the active region(s), and an interlayerinsulating film 104 located on the surface of the device isolatingfilm(s) 102 and on the surface of the photo diode(s) 103. Although notshown in FIG. 2, the interlayer insulating film 104 includes lightshielding layer(s) at predetermined location(s) to prevent light fromreaching regions other than the photo diode region(s) 103.

Color filter layer(s) 105 for transmitting light of a particularwavelength to corresponding ones of the photo diode(s) 103 are locatedon the interlayer insulating film 104 over their respective photodiode(s) 103. An over coat layer 106 is located on the interlayerinsulating film 104 and on the color filter layer(s) 105. One or moremicrolens 107 for focusing light are located on the over coat layer 106over the photo diode(s) 103.

Each microlens 107 refracts light running parallel to a light axis ofthe microlens 107 to a focal point on the light axis. Since each imagesensor has tens of thousands of microlenses 107, the microlenses 107must provide the same effect to produce a clear image. Thus, theperformances of the microlenses 107 are so important that the quality ofthe CMOS image sensor is dependent thereon.

A method for fabricating the microlenses 107 of the prior art CMOS imagesensor will now be described. FIGS. 3A to 3D are cross-sectional viewsillustrating a prior art microlens at various stages of fabrication.

As described with reference to FIG. 2, an over coat layer 106 is formedon the entire surface of the interlayer insulating film 104 and thecolor filter layer(s) 105 formed thereon. Then, as shown in FIG. 3A, aphotoresist film 107 is coated on the over coat layer 106.

Referring to FIG. 3B, the photoresist film 107 is selectively patternedby photolithography to form a plurality of microlens unit patterns onthe over coat layer 107. The microlens unit patterns are located overthe photo diodes 103. Referring to FIG. 3C, the photoresist film 107 isbaked at a temperature of about 150° C. to melt the microlens unitpatterns to form convex microlenses 107 a.

The above process of fabricating microlenses of a CMOS image sensor issimplified by the fact that the microlens is formed of a material whichis identical to the photoresist film. However, the prior art CMOS imagesensor and method for fabricating the same have certain disadvantages.

For example, it is necessary to form the microlenses 107 in a last phaseof the fabrication process because the microlens is formed of thephotoresist material, which has a low melting point. As a result, thecolor filter layer(s) 105, the interlayer insulating film 104, and theover coat layer 106 separate the microlenses 107 from their respectivephoto diodes 103 by a significant distance, thereby resulting in poorfocusing power of the microlenses 107.

Further, it is difficult to control the radius of curvature of themicrolenses 107, and to form uniform microlenses 107 on the whole,because the microlenses 107 are formed by baking the photoresistpattern.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 illustrates a circuit equivalent to one pixel of a prior art CMOSimage sensor.

FIG. 2 is a cross-sectional view of a prior art CMOS image sensor.

FIGS. 3A to 3C are cross-sectional views illustrating a prior art methodfor fabricating a microlens.

FIG. 4 is a cross-sectional view of an example CMOS image sensorconstructed in accordance with the teachings of the present invention.

FIGS. 5A to 5D are cross-sectional views illustrating an example methodfor fabricating a CMOS image sensor performed in accordance withteachings of the present invention.

FIG. 6 is a cross-sectional view of a second CMOS image sensorconstructed in accordance with the teachings of the present invention.

FIGS. 7A to 7E are cross-sectional views illustrating another examplemethod for fabricating a CMOS image sensor performed in accordance withthe teachings of the present invention.

Wherever possible, the same reference numbers will be used throughoutthe drawings to refer to the same or like parts.

DETAILED DESCRIPTION

FIG. 4 is a cross-sectional view of an example CMOS image sensorconstructed in accordance with the teachings of the present invention.FIGS. 5A to 5D are cross-sectional views illustrating an example methodof fabricating the CMOS image sensor of FIG. 4.

Referring to FIG. 4, the illustrated CMOS image sensor includes one ormore active region(s) defined by one or more device isolating film(s)302. The image sensor includes a P type semiconductor substrate 300having a P type epitaxial layer 301 formed therein. One or more lightreceiving devices (e.g., photodiode(s) 303), are formed on predeterminedregion(s) of the active region(s).

An interlayer insulating film 304 is formed on the entire surface of theepitaxial layer 301 of the semiconductor substrate 300. In other words,the interlayer insulating film 304 is formed over the photo diode(s) 303and device isolating film(s) 302. One or more microlenses 400 having afirst dielectric film pattern 305 a and a second dielectric film pattern306 a are formed on the interlayer insulating film 304.

In the illustrated example, the first dielectric film pattern 305 a hasthe identical area and shape as the photo diode 303. The seconddielectric film pattern 306 a is located at the sides of the firstdielectric film pattern 305 a and has the shape of sidewall spacers. Thesecond dielectric film pattern 306 a is formed of a material having ahigher index of refraction than the first dielectric film pattern 305 a.Since the spacer shaped second dielectric film pattern 306 a has ahigher refractive index than the first dielectric film pattern 305 a,and surrounds the photo diode 303, the second dielectric film pattern306 a enables the microlens 400 to collect more light, thereby improvingits light focusing power.

A third dielectric film 307 is formed on the first dielectric filmpattern 305 a and the second dielectric film pattern 306 a. It ispreferable that the third dielectric film 307 has substantially the samean index of refraction as the first dielectric film pattern 305 a.

One or more color filter layer(s) 308 are formed on the third dielectricfilm 307 above respective ones of the photo diode(s) 303. An over coatlayer 309 is formed on the resulting structure including on the colorfilter layer(s) 308 and any exposed surfaces of the third dielectricfilm 307.

A method of fabricating the CMOS image sensor of FIG. 4 will now bedescribed. Referring to FIG. 5A, a semiconductor substrate 300 (forexample, a p type single crystal silicon substrate) is provided. A ptype epitaxial layer 301 is formed on the semiconductor substrate 300.

The p type epitaxial layer 301 will form large and deep depletionregions in low voltage photo diode(s) to be formed later, so as toenhance the capability of the photo diode(s) 303 to collectphoto-charges, and, thus, improving the photo sensitivity of the photodiode(s).

Next, active region(s) and field region(s) are defined on the epitaxiallayer 301 by forming device isolating films 302. ‘N’ type impurity ionsare injected into predetermined portion(s) of the epitaxial layer 301 inthe active region(s), to form the photo diode(s) 303.

An interlayer insulating film 304 is formed on the entire surface of theepitaxial layer 301 including on the photo diode(s) 303 and the deviceisolating films 302. Although not shown, a light shielding layer maythen be formed on the interlayer insulating film 304 to prevent lightfrom reaching regions other than the photo diode(s) 303. The interlayerinsulating film 304 is a dielectric film comprising a general widelyused oxide. The other dielectric materials have similar indices ofrefraction.

Referring to FIG. 5B, a first dielectric film 305 a is formed on theinterlayer insulating film 304. The first dielectric film has athickness in a range of about 5000˜15000 Å. It is preferable that thefirst dielectric film 305 a is formed of an oxide. Then, the firstdielectric film 305 a is selectively patterned by photolithography andetching to form a plurality of dielectric film patterns 305 a on theinterlayer insulating film 304 over the photo diodes 303. That is, thefirst dielectric film patterns 305 a are formed such that the firstdielectric film 305 a remains on regions over the photo diodes 303,while the other portions of the first dielectric film 305 a are removed.In the illustrated example, each first dielectric film pattern 305 a hassubstantially the same area as its corresponding photo diode 303. Morespecifically, it is preferable that each of the first dielectric filmpatterns 305 a has a width in a range of about 0.5˜2 μm.

Next, a second dielectric film 306 is formed on the entire surface ofthe resulting structure including on the first dielectric film(s) 305 ato a thickness in a range of about 5000˜15000 Å. The second dielectricfilm 306 is formed of a material having a greater index of refractionthan the first dielectric film(s) 305 a. It is preferable that thesecond dielectric film 306 is formed of a nitride if the firstdielectric film is formed of an oxide.

Referring to FIG. 5C, the second dielectric film 306 is etched by dryetching, (e.g., by reactive ion etching (RIE) having an anisotropic etchcharacteristic), until the surface(s) of the first dielectric filmpattern(s) 305 a and the interlayer insulating film 304 are exposed. Asa result, the second dielectric film pattern 306 a is formed intosidewall spacer shapes located at sides of the first dielectric filmpattern(s) 305 a. Thus, a plurality of microlenses 400 each of whichincludes a first dielectric film pattern 305 a and the adjacentsidewalls formed by the second dielectric film pattern 306 a is formed.

In the illustrated example, it is preferable that the first dielectricfilm has an index of refraction in a range of about 1.3˜1.7, and thatthe second dielectric film has an index of refraction in a range ofabout 1.8˜2.2. Because the second dielectric film pattern 306 a at thesides of the first dielectric film pattern 305 a can refract lightincident on regions other than on the upper portion of the firstdielectric pattern 305 a, (i.e., on regions other than the photo diode303 region), such that the light is directed into a lower region of thefirst dielectric film pattern 305 and, ultimately, onto the photo dioderegion 303.

After the microlenses 400 (i.e., the first and second dielectric filmpatterns 305 a, 306 a) are formed, a third dielectric film 307 is formedon an entire surface of the resulting structure including on themicrolenses 400. Preferably, the third dielectric film 307 is formed ofa material having an index of refraction which is substantially the sameas the index of refraction of the first dielectric film to allow lightpassed through the third dielectric film 307 to be received in the firstdielectric film undisturbed. It is preferable that the interlayerinsulating film 304 and the third dielectric film 307 have substantiallythe same index of refraction.

Referring to FIG. 5D, red (R), green (G), and/or blue (B) color filterlayers 308 are formed on the third dielectric film 307 above respectiveones of the photo diodes. The color filter layer 308 allow light of aparticular wavelength to pass to their respective photo diodes 303 viatheir respective microlenses 400. An over coat layer 309 is formed onthe entire surface of the resulting structure, including on the colorfilter layers 308.

FIG. 6 is a cross-sectional view of another example CMOS image sensorconstructed in accordance with the teachings of the present invention.FIGS. 7A to 7E are cross-sectional views illustrating an example methodfor fabricating the CMOS image sensor of FIG. 6. Persons of ordinaryskill in the art will appreciate that, although only one photo diode andmicrolens structure is shown in FIGS. 6 and 7A–7E, multiple photo diodesand multiple microlenses will typically be formed.

Referring to FIG. 6, the illustrated CMOS image sensor includes a P typeepitaxial layer 401 formed on a semiconductor substrate 400. An activeregion is defined in the epitaxial layer 401 by a device isolating film402. A light receiving device 403 (i.e., a photo diode), is formed in apredetermined region of the active region.

An interlayer insulating film 404 is formed on the entire surface of theepitaxial layer 401. A microlens 500 is formed on the interlayerinsulating film 404 over the photo diode 403. The microlens 500comprises a first dielectric film pattern 405 a, a second dielectricfilm pattern 406 a, and a third dielectric pattern 407 a.

In the illustrated example, the first dielectric film pattern 405 a andthe second dielectric pattern 406 a are stacked in succession on thesame area as the photo diode 403. The third dielectric film pattern 407a is formed at the sides of the first and second dielectric filmpatterns 405 a, 406 a in the shape of sidewall spacers. The first andthird dielectric film patterns 405 a, 407 a are formed of a materialhaving a higher index of refraction than the second dielectric filmpattern 406 a. The first and third dielectric film patterns 405 a, 407 ahave substantially the same refractive index.

Since the spacer shaped third dielectric film pattern 407 a has a higherindex of refraction than the second dielectric film pattern 406 a, andsince the spacer shaped third dielectric film pattern 407 a is formed ona region outside of the photo diode 403, the third dielectric filmpattern 407 a enables the microlens 400 to collect more light and, thus,to have an improved light focusing power.

A fourth dielectric film 408 is formed on the entire upper surface ofthe resulting structure (including on the microlens 500). It ispreferable that the second and fourth dielectric films 406 a, 408, andthe interlayer insulating film 404 have the same index of refraction.

A color filter layer 409 is formed on the fourth dielectric film 408over the photo diode 403. An over coat layer (not shown) is formed onthe fourth dielectric film 408 and on the color filter layer 409.

A method of fabricating the CMOS image sensor of FIG. 6 will now bedescribed. Referring to FIG. 7A, a semiconductor substrate (for example,a p type single crystal silicon substrate) 400 is provided. A p typeepitaxial layer 401 is formed on the semiconductor substrate 400. The ptype epitaxial layer 401 will form a large and deep depletion region ina low voltage photo diode to be formed later, so as to enhance thecapability of the photo diode to collect photo-charges and, thus,improve the photo sensitivity of the photo diode.

An active region and a field region are defined in the epitaxial layer401 by a device isolating film 402. ‘N’ type impurity ions are injectedinto a predetermined portion of the epitaxial layer 401 in the activeregion to form the photo diode 403.

An interlayer insulating film 404 is formed on the entire surface of theepitaxial layer 401 (including on the photo diode 403). Then, althoughnot shown, a light shielding layer may be formed on the interlayerinsulating film 404 to block light incident on regions other than thephoto diode 403.

A first dielectric film 405 and a second dielectric film 406 aresuccessively formed on the interlayer insulating film 404. Preferably,each of the first dielectric film 405 and the second dielectric film 406are formed to a thickness in a range of about 5000˜15000 Å. It is alsopreferable to form the first dielectric film 405 of a material having ahigher index of refraction than the second dielectric film 406 and theinterlayer insulating film 404. Preferably, if the interlayer insulatingfilm 404 and the second dielectric film 406 are formed of oxide, thefirst dielectric film 405 is formed of nitride. The thickness of each ofthe first and second dielectric films 405, 406 is not limited to theabove, but rather, these thicknesses are adjustable according to thedesired characteristics of the device.

Referring to FIG. 7B, the first dielectric film 405 and the seconddielectric film 406 are selectively patterned by photolithography andetching to form first and dielectric film patterns 405 a, 406 a on theinterlayer insulating film 404 over the photo diode 403. (Of course,where multiple photo diodes 403 are employed, a plurality of first andsecond dielectric film patterns 405 a, 406 a are formed on theinterlayer insulating film 404 over the photo diode 403. In other words,the first and second dielectric film patterns 405 a, 406 a are formedsuch that the first and second dielectric films 405, 406 remain onregions over the photo diodes 403, while other portions of the first andsecond dielectric films 405, 406 are removed).

In the illustrated example, the first and second dielectric filmpatterns 405 a, 406 a are formed so as to be in conformity with thephoto diode regions. More specifically, it is preferable that the firstand second dielectric film patterns 405 a, 406 a have a width in a rangeof about 0.5˜2 μm.

Referring to FIG. 7C, a third dielectric film 407 is formed on theentire surface of the structure of FIG. 7B (including on the first andsecond dielectric film patterns 405 a, 406 a) to a thickness in a rangeof about 10000˜30000 Å. Of course, the thickness of the third dielectricfilm 407 is also not limited to the above, but is instead adjustable tosuit the application. The third dielectric film 407 is formed of amaterial having substantially the same index of refraction as the firstdielectric film pattern 405 a.

Referring to FIG. 7D, the third dielectric film 407 is etched by dryetching (e.g., by reactive ion etching (RIE) having an anisotropic etchcharacteristic) until a surface of the second dielectric film pattern406 a and a surface of the interlayer insulating film 404 are exposed.As a result, a sidewall spacer shaped third dielectric film pattern 407a is formed on the sides of the first and second dielectric filmpatterns 405 a, 406 a. Thus, a microlens 500 comprising the first,second, and third dielectric film patterns 405 a, 406 a, and 407 a isformed.

In the illustrated example, it is preferable that the first and thirddielectric film patterns 405 a, 407 a have an index of refraction in arange of about 1.8˜2.2. It is also preferable that the second dielectricfilm has an index of refraction in a range of about 1.3˜1.7.

Referring to FIG. 7E, after the microlens 500 is formed, a fourthdielectric film 408 is formed on the entire surface of the structure ofFIG. 7D (including on the microlens 500). Preferably, the fourthdielectric film 408 is formed of a material having substantially thesame index of refraction as the second dielectric film pattern 406 a.

Next, red (R), green (G), and/or blue (B) color filter layers 409 areformed on the fourth dielectric film 408 over respective ones of thephoto diodes 403. Each color filter layer 409 allows light of aparticular wavelength to reach its respective photo diode 403 via themicrolens 500. Next, an over coat layer (not shown) is formed on theentire surface of the structure of FIG. 7E (including on the colorfilter layer 409) to complete the fabrication of the CMOS image sensor.

Unlike the first example, the second example CMOS image sensor has theadditional first dielectric film pattern 405 a. Although the firstdielectric film 405 a may reduce the transmittivity of light, the firstdielectric film pattern 405 a (preferably of silicon nitride) can reduceleakage current. The drop of transmittivity is minimal.

From the foregoing, persons of ordinary skill in the art will appreciatethat the above disclosed CMOS image sensors and methods for fabricatingthe same have several advantages. For instance, in the first examplesensor, the microlens 400 is a combination of the first dielectric filmpattern 305 a having the shape of the photo diode 303, and the seconddielectric film pattern 306 a located at sidewalls of the firstdielectric film pattern 305 a. The refractive index of the seconddielectric film 306 a is higher than the refractive index of the firstdielectric film 305 a. Accordingly, light incident on the portion of themicrolens over the photo diode is focused onto the photo diode owing tothe characteristics of the light traveling in a straight line, and lightincident on regions of the microlens outside of the photo diode 303 arealso focused onto the photo diode owing to the refractive index of thesecond dielectric film 306 a. Therefore, the focusing power of themicrolens is improved relative to the prior art.

In the second example described above, the refractive indices of thefirst and third dielectric film patterns are higher than the refractiveindices of the second and fourth dielectric films. As a result, sincethe light incident on a portion of the microlens 500 over the photodiode 403 is focused onto the photo diode 403, and light incident onregions outside of the photo diode 403 are also focused onto the photodiode 403 owing to the refractive index of the third dielectric film 407a, the focusing power of the microlens 500 is improved relative to theprior art.

Further, since the first, second, third, and fourth dielectric films canbe formed in a high temperature process, high temperature processes maybe carried out after formation of the microlens. In addition, since themicrolens is formed before the color filter layer, the distance betweenthe photodiode and the microlens is reduced. As a result, the focusingpower of the microlens is improved relative to the prior art.

Moreover, in the second example, the center portion (i.e., the firstdielectric material) and the edge portion (i.e., the third dielectricmaterial) of the microlens is formed of silicon nitride having arelatively high index of refraction. As a result, device leakage currentis reduced due to the high H₂ content of the silicon nitride film.

In view of the foregoing, persons of ordinary skill in the art willappreciate that CMOS image sensors and a methods for fabricating thesame have been disclosed. In the disclosed examples, a microlens isformed not by baking a photoresist film, but by etching a dielectricfilm. As a result, the microlens has strong focusing power.

A disclosed example CMOS image sensor includes a semiconductor substratehaving a photo diode, an interlayer insulating film on the semiconductorsubstrate, a microlens including a first dielectric film located on theinterlayer insulating film over the photo diode and a second dielectricfilm located at sidewalls of the first dielectric film pattern, and athird dielectric film on the interlayer insulating film and themicrolens.

Another disclosed example CMOS image sensor comprises a semiconductorsubstrate having a photo diode, an interlayer insulating film on thesemiconductor substrate, a microlens including a first and seconddielectric films located on the interlayer insulating film over thephoto diode and a third dielectric film at sidewalls of the first andsecond dielectric films, and a fourth dielectric film on the interlayerinsulating film and on the microlens.

A disclosed example method for fabricating a CMOS image sensor comprisesinjecting impurity ions into a predetermined region of a semiconductorsubstrate to form a photo diode, forming an interlayer insulating filmon the semiconductor substrate, forming a first dielectric film on theinterlayer insulating film over the photo diode, forming a seconddielectric film at four sidewalls of the first dielectric film to form amicrolens comprising the first and second dielectric films, and forminga third dielectric film on the interlayer insulating film and on themicrolens.

In another disclosed example method for fabricating a CMOS image sensorcomprises injecting impurity ions into a predetermined region of asemiconductor substrate to form a photo diode, forming an interlayerinsulating film on the semiconductor substrate, successively formingfirst and second dielectric films on the interlayer insulating film andpatterning the first, and second dielectric films such that the firstand second dielectric films remain on the interlayer insulating filmover the photo diode, forming a third dielectric film at the sidewallsof the first and second dielectric films to form a microlens includingthe first and second dielectric films, and forming a fourth dielectricfilm on the interlayer insulating film and on the microlens.

It is noted that this patent claims priority from Korean PatentApplication Serial Number P2003-0101545, which was filed on Dec. 31,2003, and Korean Patent Application Serial Number P2004-0063466, whichwas filed on Aug. 12, 2004, both of which are hereby incorporated byreference in their entirety.

Although certain example methods, apparatus and articles of manufacturehave been described herein, the scope of coverage of this patent is notlimited thereto. On the contrary, this patent covers all methods,apparatus and articles of manufacture fairly falling within the scope ofthe appended claims either literally or under the doctrine ofequivalents.

1. A method for fabricating a CMOS image sensor comprising: injectingimpurity ions into a predetermined region of a semiconductor substrateto form a photo diode; forming an interlayer insulating film on thesemiconductor substrate; forming a first dielectric film on theinterlayer insulating film over the photo diode; forming a seconddielectric film at sidewalls of the first dielectric film to form amicrolens; and forming a third dielectric film on the interlayerinsulating film and on the microlens.
 2. A method as claimed in claim 1,wherein an index of refraction of the second dielectric film pattern ishigher than an index of refraction of the first dielectric film.
 3. Amethod as claimed in claim 1, wherein an index of refraction of thefirst dielectric film and an index of refraction of the third dielectricfilm are substantially identical.
 4. A method as claimed in claim 1,wherein the first dielectric film has an index of refraction of about1.3˜1.7, and the second dielectric film has an index of refraction ofabout 1.8˜2.2.
 5. A method as claimed in claim 1, wherein the firstdielectric film is an oxide film, and the second dielectric film is anitride film.
 6. A method as claimed in claim 1, wherein an area of thefirst dielectric film is substantially identical to an area of the photodiode.
 7. A method as claimed in claim 1, further comprising forming acolor filter layer on the third dielectric film over the photo diode. 8.A method for fabricating a CMOS image sensor comprising: injectingimpurity ions into a predetermined region of a semiconductor substrateto form a photo diode; forming an interlayer insulating film on thesemiconductor substrate; successively forming first and seconddielectric films on the interlayer insulating film; patterning the firstand second dielectric films such that the first and second dielectricfilms remain on the interlayer insulating film over the photo diode;forming a third dielectric film at sidewalls of the first dielectricfilm and second dielectric film to form a microlens; and forming afourth dielectric film on the interlayer insulating film and on themicrolens.
 9. A method as claimed in claim 8, wherein indices ofrefraction of the first and second dielectric film are higher thanindices of refraction of the second and fourth dielectric films.
 10. Amethod as claimed in claim 8, wherein an index of refraction the firstdielectric film is substantially identical to an index of refraction ofthe third dielectric film.
 11. A method as claimed in claim 8, whereinthe indices of refraction of the first and third dielectric films areabout 1.8˜2.2, and the indices of refraction of the second and fourthdielectric films are about 1.3˜1.7.
 12. A method as claimed in claim 8,wherein the first and third dielectric films are nitride films, and thesecond and fourth dielectric films are oxide films.
 13. A method asclaimed in claim 8, wherein areas of the first and second dielectricfilms are substantially equal to an area of the photo diode.
 14. Amethod as claimed in claim 8, further comprising forming a color filterlayer on the fourth dielectric film over the photo diode.